发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to an embodiment, a semiconductor device includes a first semiconductor part and a conductive electrode. The first semiconductor part is made of SiC. The SiC contains a first element as an n-type or p-type impurity. The first semiconductor part has a first interface part. The first interface part is configured to have the maximum area density of the first element. The c conductive electrode is electrically connected to the first interface part.
申请公布号 KR20140085334(A) 申请公布日期 2014.07.07
申请号 KR20130161505 申请日期 2013.12.23
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIMIZU TATSUO
分类号 H01L21/337 主分类号 H01L21/337
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