| 摘要 |
The present invention relates to an apparatus and a method for detecting an error chamber of an in-line deposition system, and more particularly to an apparatus and a method for detecting an error chamber using a sensor included in a shuttle. The apparatus for detecting an error chamber includes a device communication unit to receive and output sensor information from a shuttle; and a controller to detect whether an error occurs in a chamber where the shuttle is located using the sensor information. The sensor information is generated by a sensor included in the shuttled and the generated sensor information is transmitted to the apparatus for detecting an error chamber. According to the present invention, the moving speed and slop of the shuttle in the chamber and the internal temperature of the chamber can be detected in real time so that a point of the error can be instantly recognized. |
