| 摘要 |
A multi-charged particle beam writing apparatus comprises: a movable stage for mounting a target object; an emission unit for emitting a charged particle beam; an aperture member which has a plurality of openings and produces multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting a part of the charged particle beam pass through the openings; a reduction optical system which reduces the multiple beams; and a doublet lens which is arranged at the rear end of the reduction optical system and in which a magnification is 1 and directions of magnetic fluxes are opposite. |
