COMPOSITION FOR ENCAPSULATION, BARRIER LAYER COMPRISING THE SAME AND ENCAPSULATED APPARATUS COMPRISING THE SAME

摘要

The present invention relates to a composition for encapsulation which comprises a photocurable monomer (A) and a photocurable monomer (B) including a carboxylic acid group, wherein the photocurable monomer (B) including a carboxylic acid group has an amide bond; to a barrier layer including the composition; and to an encapsulated apparatus including the composition.