发明名称 |
SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF OXIDE SEMICONDUCTOR LAYER |
摘要 |
<p>PROBLEM TO BE SOLVED: To reduce variations in threshold voltage to stabilize electric characteristics of a thin-film transistor including an oxide semiconductor layer, and to reduce an off current.SOLUTION: In a thin-film transistor including an oxide semiconductor layer, an oxide semiconductor layer containing an insulating oxide is laminated on an oxide semiconductor layer and a thin-film transistor is formed so that the oxide semiconductor layer and a source electrode layer or a drain electrode layer are in contact with each other via the oxide semiconductor layer containing the insulating oxide. With this method, the variations in threshold voltage of the thin-film transistor can be reduced and electric characteristics can be stabilized. In addition, an off current can be reduced.</p> |
申请公布号 |
JP2014123751(A) |
申请公布日期 |
2014.07.03 |
申请号 |
JP20140009430 |
申请日期 |
2014.01.22 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
GOTO HIROMITSU;AKIMOTO KENGO;YAMAZAKI SHUNPEI |
分类号 |
H01L29/786;G02F1/1368;H01L21/336;H01L51/50;H05B33/14 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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