NANOIMPRINT LITHOGRAPHY

摘要

A mold may include a plurality of nanostructures configured to form a lithographic pattern when imprinted into a material. Imprinting may include imprinting the mold a first predetermined distance, modifying a temperature of the material, and altering a position of the mold based on the temperature modification. One or more thermal elements may alter a temperature of a first section of the material and/or one or more nanostructures for a predetermined pulse time less than an equilibrium time required for the mold and/or material to reach a stable temperature state. A first thermal element may selectively alter the temperature of a first section of the material and/or a first nanostructure and a second thermal element may selectively alter the temperature of a second section of the material and/or a second nanostructure. The one or more thermal elements may include one or more thermoelectric elements.

主权项

1. A system for nanoimprinting a lithographic pattern into a material, the system comprising:
a mold comprising a plurality of nanostructures, wherein the plurality of nanostructures are configured to form the lithographic pattern when imprinted into the material; an imprinting mechanism configured to imprint the mold a first predetermined distance into the material; and a first thermal element configured to modify a temperature of the material during or after imprinting of the mold, wherein after the temperature modification, the imprinting mechanism is further configured to adjust a position of the mold based on the temperature modification.