METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK

摘要

According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

主权项

1. A method for manufacturing a reflective mask comprising a substrate, a reflection layer formed on a major surface of the substrate, an absorption layer formed on the reflection layer, a pattern region formed in the absorption layer, the method comprising:
forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer; and the forming the light blocking region including etching-processing the reflection layer using a gas containing chlorine and oxygen.