PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE
摘要
One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.
申请公布号
WO2014105819(A1)
申请公布日期
2014.07.03
申请号
WO2013US77474
申请日期
2013.12.23
申请人
SPUTTERING COMPONENTS, INC.
发明人
CROWLEY, DANIEL THEODORE;MORSE, PATRICK LAWRENCE;MEREDITH, JR., WILLIAM A.;GERMAN, JOHN ROBERT;NEAL, MICHELLE LYNN