发明名称 OPTICAL METHOD AND SYSTEM FOR CRITICAL DIMENSIONS AND THICKNESS CHARACTERIZATION
摘要 <p>Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.</p>
申请公布号 WO2014102792(A1) 申请公布日期 2014.07.03
申请号 WO2013IL51075 申请日期 2013.12.26
申请人 NOVA MEASURING INSTRUMENTS LTD. 发明人 SHAFIR, DROR;BARAK, GILAD;WOLFING, SHAY
分类号 G01B9/00;G01B11/25;G01J3/42;G01J3/447;G01J3/45;G01J4/00;G01N21/00;G02B21/00 主分类号 G01B9/00
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