SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD

摘要

The purpose of the present invention is to provide a semiconductor manufacturing apparatus and a semiconductor manufacturing method which are capable of safely removing oily silane without the deterioration of throughput. The semiconductor manufacturing apparatus according to the present invention comprises a reaction chamber receiving a wafer therein; a process gas supplying unit supplying process gas into the reaction chamber; a wafer supporting member arranging the wafer; a heater for heating the wafer at a predetermined temperature; a rotation control unit for rotating the wafer; a gas discharging unit having an exhaust port discharging the gas from the reaction chamber; and a drain installed at the lower side of the reaction chamber and used for receiving the oily silane.