Carrier film for mounting polishing workpiece and method for making the same

摘要

The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate consists of first elastomer, the first elastomer comprising a plurality of first holes; wherein the first holes have a drop shape, and each of the first holes has an opening. The buffer substrate consists of second elastomer, the second elastomer comprising a plurality of second holes. The surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.

主权项

1. A polishing device comprising:
a base plate; a carrier film adhered to the base plate for mounting a polishing workpiece in a process of chemical mechanical polishing, comprising: a surface substrate consisting of first elastomer, the first elastomer comprising a plurality of first holes; wherein the plurality of first holes have a drop shape, and each of the plurality of first holes has an opening, a buffer substrate consisting of second elastomer, the second elastomer comprising a plurality of second holes; wherein the surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer; wherein the first elastomer and the second elastomer are the same and are polyurethane; a polishing workpiece mounted by the carrier film; and a polishing pad placed against the polishing workpiece and polishing the polishing workpiece in the process of chemical mechanical polishing.