发明名称 An integrated circuit device having barrier and method of fabricating the same
摘要 <p>An integrated circuit device includes a semiconductor die, the semiconductor die including a semiconductor substrate, driving/control circuitry disposed along a peripheral region of the semiconductor die, a MEMS device disposed within a central region of the semiconductor die, and a barrier disposed between the driving/control circuitry and the MEMS device.</p>
申请公布号 KR101414416(B1) 申请公布日期 2014.07.01
申请号 KR20087031742 申请日期 2007.05.24
申请人 发明人
分类号 H01L27/14;H01L29/82;H01L29/84 主分类号 H01L27/14
代理机构 代理人
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