发明名称 |
Color filter array having hybrid color filters and manufacturing method thereof |
摘要 |
A method for manufacturing a color filter array having hybrid color filters includes providing a high-grade photoresist and a low-grade photoresist, forming a plurality of first color filters on a substrate, and forming a plurality of second color filters and a plurality of third color filters on the substrate. The first color filters include the high-grade photoresist, and the second color filters and the third color filters include the low-grade photoresist. The high-grade photoresist of the first color filters includes a first amount of large size pigments in one unit area and the low-grade photoresists of the second color filters and the third color filters include a second amount of large size pigments in one unit area. A ratio of the second amount to the first amount is equal to or larger than 1. |
申请公布号 |
US8765333(B2) |
申请公布日期 |
2014.07.01 |
申请号 |
US201213561103 |
申请日期 |
2012.07.30 |
申请人 |
United Microelectronics Corp. |
发明人 |
Yu Cheng-Hung |
分类号 |
G02B5/20;G03F7/20 |
主分类号 |
G02B5/20 |
代理机构 |
|
代理人 |
Hsu Winston;Margo Scott |
主权项 |
1. A method for manufacturing a color filter array (CFA), comprising:
providing a high-grade photoresist and a low-grade photoresist; forming a plurality of first color filters on a substrate, the first color filters comprising the high-grade photoresist; and the high-grade photoresist of the first color comprising a first amount of large size pigments in one unit area; and forming a plurality of second color filters and a plurality of third color filters on the substrate after forming the first color filters, the second color filters and the third color filters comprising the low-grade photoresist, and the low-grade photoresists of the second color and the third color comprising a second amount of large size pigments in one unit area; wherein a ratio of the second amount to the first amount is equal to or larger than 1. |
地址 |
Science-Based Industrial Park, Hsin-Chu TW |