| 摘要 |
A deposition apparatus includes a vacuum chamber, a substrate which is disposed in the vacuum chamber, a deposition source which is disposed in the vacuum chamber to be opposed to the substrate and supplies deposition material to the substrate, a laser oscillation unit which generates a first laser beam, and an optical unit which is connected to a side of the vacuum chamber and generates a plurality of masked laser beams by splitting the first laser beam, whereby the masked laser beams are emitted to inside of the vacuum chamber and disposed between the substrate and the deposition source, deposition material in contact with the masked laser beams are oxidized, and the deposition material, which has passed through the gap between the masked laser beams, is deposited on the substrate. |
