| 摘要 |
The present invention relates to a method for forming a layer by using a layer forming apparatus having a rotating table capable of loading a plurality of substrates thereon, a first gas supply unit, and a second gas supply unit. The method includes: a first process of rotating the rotating table by supplying an oxide gas from the first and second gas supply units; a second process of supplying a first reaction gas including a first element from the first gas supply unit, rotating the rotating table by supplying the oxide gas from the second gas supply unit, and forming a first oxide layer including the first element on the substrate; a third process of rotating the rotating table by supplying the oxide gas from the first and second gas supply units; and a fourth process of supplying a second reaction gas including a second element from the first gas supply unit, rotating the rotating table by supplying the oxide gas from the second gas supply unit, and forming a second oxide layer including the second element on the substrate. |
