| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a magnetic disk substrate that can reduce defects in a substrate surface after polishing without impairing productivity, and to provide a method of producing and polishing a magnetic disk substrate using the same.SOLUTION: A polishing liquid composition for a magnetic disk substrate includes a polishing material, an acid, an oxidant, and a compound (A) having a molecular wight of 1,000 or less and having one or more amino group and one or more sulfonic acid group in one molecule, excluding sulfamic acid. The compound (A) includes preferably an aminobenzenesulfonic acid skeleton. A magnetic disk substrate to be polished is, for example, a magnetic disk substrate having an Ni-P containing layer. |
