PROCESS OF CLEANING MASK FOR IMPRINTING

摘要

PROBLEM TO BE SOLVED: To provide a process of cleaning a mask for imprinting capable of removing foreign substances on a mask without etching the mask.SOLUTION: The process of cleaning a mask for imprinting according to an embodiment includes: a template having an uneven pattern; a foundation layer provided on the template; and a sacrificial film provided on the foundation layer. The process of cleaning a mask for imprinting includes: removing the sacrificial film; and removing foreign substances adhered to the sacrificial film.