| 摘要 |
PROBLEM TO BE SOLVED: To provide an electronic exposure device in which the time required for stage movement or stage establishment can be reduced significantly, while enhancing the throughput.SOLUTION: An electronic exposure device 1 includes a surface pattern electron generation part 2 for generating electrons in planar pattern, surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation part 2, a mapping projection unit 9 for projection mapping electrons generated from the surface pattern electron generation part 2 to the imaging position on the exposed surface of an exposed member S, and an imaging condition control unit 10 for controlling the imaging condition of the mapping projection unit 9. The surface pattern electron generation part 2 is divided into a plurality of electron generation regions (regions A, B) depending on the distance from the central axis of the surface pattern electron generation part 2. The surface pattern control unit 3 generates electrons at different timing for each electron generation region, and the imaging condition control unit 10 sets a different imaging condition for each electron generation region. |
