| 摘要 |
A gas intake and exhaust unit may include a gas supply pipe with a gas supply path; a gas exhaust pipe with a gas exhaust path communicating with the gas supply path; and a gas intake pipe to surround at least a part of the outer peripheral portion of the gas exhaust pipe so that a gas intake path is formed inside the gas intake pipe. Accordingly, when the gas intake and exhaust unit is disposed close to a substrate, supply and suction of gas are simultaneously performed. Accordingly, since deposition is performed at normal pressure, a device and time to ensure additional vacuum are not required. Further, a continuous process is possible so that pre-processing and post-processing may be simultaneously performed on the same line, and a plurality of gas intake and exhaust units are installed so that a multi-component compound may be formed. In this case, a type of a heat source and supplied heat energy may be determined according to a decomposition temperature of each source. |
