| 摘要 |
A system for cleaning a photomask with a target surface includes a retaining device for retaining the photomask, a cleansing device, an elevating platform and a drying device. The cleansing device has a fluid dispensing unit and a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is used to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. At least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination. |
