| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection substrate structure which can reduce incident light reflectances at different wavelengths and a manufacturing method thereof.SOLUTION: The manufacturing method of an antireflection substrate structure 100 includes: providing a silicon wafer 110 having a first rough surface 112; forming, on the silicon wafer 110, an antireflection film 120 conformally covering the first rough surface; performing a surface treatment on the antireflection film to form a hydrophilic surface 122a on the side relatively far away from the silicon wafer, of the antireflection film; dropping a colloidal solution 130 including a solution and a plurality of nano-balls 134 capable of adhering to the hydrophilic surface, on the hydrophilic surface of the antireflection film; and performing an etching process on the hydrophilic surface of the antireflection film by taking the nano-balls as an etching mask to form a second rough surface 122 having a roughness different from that of the first rough surface. |
