| 发明名称 |
SURFACE DEFECT INSPECTION METHOD AND APPARATUS |
| 摘要 |
A surface defect inspection apparatus and method is provided which illuminates a plurality of beams set to different intensity values to a sample. Scattered light from the plurality of beams is detected and processed to analyze the surface defects. |
| 申请公布号 |
US2014176943(A1) |
申请公布日期 |
2014.06.26 |
| 申请号 |
US201414189921 |
申请日期 |
2014.02.25 |
| 申请人 |
Hitachi High-Technologies Corporation |
发明人 |
OSHIMA Yoshimasa;NAKAO Toshiyuki;MATSUI Shigeru |
| 分类号 |
G01N21/95 |
主分类号 |
G01N21/95 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A defect inspection apparatus comprising:
An illumination optical system configured to illuminate a plurality of beams set to different intensity values to a sample; a detection optical system configured to detect a scattered light from the sample; and a processing system configured to process a signal from the scattered light. |
| 地址 |
Tokyo JP |
