HEATED BACKING PLATE

摘要

The present invention generally relates to a heated backing plate coupled to a gas distribution showerhead in a PECVD chamber. The backing plate is heated by circulating a heating fluid either through channels formed within the backing plate or a tube coupled to the backing plate. A heated backing plate heats up the gas distribution showerhead, which improves the cleaning rate of the PECVD chamber that performs low temperature processes.

主权项

1. A plasma enhanced chemical vapor deposition chamber, comprising:
a gas distribution showerhead; a backing plate coupled to the gas distribution showerhead, the backing plate having a first surface facing the gas distribution showerhead and a second, substantially planar surface opposite the first surface; at least one tube disposed over at least a portion of the second surface of the backing plate; and one or more clamps coupling the at least one tube to the second surface of the backing plate.