发明名称 INTEGRATED USE OF MODEL-BASED METROLOGY AND A PROCESS MODEL
摘要 <p>Methods and systems for performing measurements based on a measurement model integrating a metrology-based target model with a process-based target model. Systems employing integrated measurement models may be used to measure structural and material characteristics of one or more targets and may also be used to measure process parameter values. A process-based target model may be integrated with a metrology-based target model in a number of different ways. In some examples, constraints on ranges of values of metrology model parameters are determined based on the process-based target model. In some other examples, the integrated measurement model includes the metrology-based target model constrained by the process-based target model. In some other examples, one or more metrology model parameters are expressed in terms of other metrology model parameters based on the process model. In some other examples, process parameters are substituted into the metrology model.</p>
申请公布号 WO2014100037(A1) 申请公布日期 2014.06.26
申请号 WO2013US75861 申请日期 2013.12.17
申请人 KLA-TENCOR CORPORATION 发明人 KUZNETSOV, ALEXANDER;SHCHEGROV, ANDREI V.;PANDEV, STILIAN IVANOV
分类号 G06F19/00 主分类号 G06F19/00
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