发明名称 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM FOR LIQUID PROCESS
摘要 A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.
申请公布号 US2014174475(A1) 申请公布日期 2014.06.26
申请号 US201314101669 申请日期 2013.12.10
申请人 TOKYO ELECTRON LIMITED 发明人 TAKAYANAGI Koji;MINEKAWA Yukie;YOSHIDA Yuichi;YOSHIHARA Kousuke;TERASHITA Yuichi;FURUSHO Toshinobu;SASA Takashi
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
主权项 1. A liquid processing apparatus comprising: a process liquid container configured to contain a process liquid; a discharge nozzle configured to discharge the process liquid to a substrate to be processed; a supply conduit connecting the process liquid container and the discharge nozzle; a filter disposed in the supply conduit and configured to filtrate the process liquid; a pump disposed in the supply conduit on a secondary side of the filter; a return conduit connecting a discharge side of the pump and a primary side of the filter; a first, a second and a third on-off valves which are disposed on a connection portion between the pump and the filter, a connection portion between the pump and the discharge nozzle, and a connection portion between the pump and the return conduit, respectively; and a control unit configured to control the pump and the first, the second and the third on-off valves; wherein: based on a control signal from the control unit, a part of the process liquid having passed through the filter by the suction of the pump is discharged from the discharge nozzle; the remaining process liquid is returned to the supply conduit on the primary side of the filter; a process liquid is synthesized by adding a replenishment amount, which is equal to the discharge amount, to the return amount; and the discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.
地址 Tokyo JP