SCANNER OVERLAY CORRECTION SYSTEM AND METHOD

摘要

A scanner overlay correction method of the present invention includes a step of performing a semiconductor manufacturing process on a plurality of substrates. The substrates are divided into a first sub-set and a second sub-set. A rework process is performed on the second sub-set of the substrates instead of the first sub-set. Each average value of at least one exposure parameter for a lithographic process is calculated for each of the first sub-set and the second sub-set of the substrates. Scanner overlay correction and average correction are applied to expose a plurality of second substrates in which the rework process is performed. The average correction is applied based on a calculated average value.