发明名称 |
SPATIAL PHASE FEATURE LOCATION |
摘要 |
Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the relative location of the substrate alignment mark such that the substrate alignment mark may be used in aligning a substrate with a template within a lithographic system with a reduced magnitude of relative displacement. |
申请公布号 |
EP2232538(A4) |
申请公布日期 |
2014.06.25 |
申请号 |
EP20080856401 |
申请日期 |
2008.12.05 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SCHUMAKER, PHILIP, D.;MOKABERI, BABAK;RAFFERTY, TOM H. |
分类号 |
H01L21/304;B82Y10/00;B82Y40/00;G03F7/00;G03F9/00 |
主分类号 |
H01L21/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|