| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern width measuring program and a pattern width measuring device, capable of accurately measuring a pattern width of a drawing pattern in which a contour has periodicity. <P>SOLUTION: A measuring program 55a makes a measuring device 50 for measuring a stepped pattern 5 drawn on the basis of stepped data 2 for which a plurality of unit shapes 3 are arranged at a fixed array pitch P and provided with the contour 5a having periodicity function as: a box setting part 56c for setting the box length L1 of boxes B1-B3 in a measurement area A of the stepped pattern 5 to a length corresponding to the array pitch P of the unit shapes 3; an electronic microscope 54 for measuring the width of the stepped pattern 5 of the boxes B1-B3 set by the box setting part 56c at a fixed interval and acquiring pattern width measurement data; and a pattern width calculation part 56f for calculating a flattened pattern width inside the boxes B1-B3 on the basis of the pattern width measurement data acquired by the electronic microscope 54. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
