发明名称 Aluminum gallium nitride barriers and separate confinement heterostructure (SCH) layers for semipolar plane III-nitride semiconductor-based light emitting diodes and laser diodes
摘要 A semipolar plane III-nitride semiconductor-based laser diode or light emitting diode, comprising a semipolar Indium containing multiple quantum wells for emitting light, having Aluminum containing quantum well barriers, wherein the Indium containing multiple quantum well and Aluminum containing barriers are grown in a semipolar orientation on a semipolar plane.
申请公布号 US8761218(B2) 申请公布日期 2014.06.24
申请号 US201113080260 申请日期 2011.04.05
申请人 The Regents of the University of California 发明人 Lin You-Da;Ohta Hiroaki;Nakamura Shuji;DenBaars Steven P.;Speck James S.
分类号 H01S5/34;H01S5/343 主分类号 H01S5/34
代理机构 Gates & Cooper LLP 代理人 Gates & Cooper LLP
主权项 1. A method of using an Aluminum (Al) containing barrier layer in a quantum well structure of a device, comprising: determining one or more acceptable amounts of one or more defects selected from misfit dislocations, stacking faults, and triangular dark defects, and triangular non-luminescent defects; selecting one or more Al compositions to obtain the amounts of the one or more defects; depositing, in a quantum well structure of a device, one or more Al containing barrier layers having the one or more Al compositions to reduce or prevent formation of the one or more defects in the device; and measuring the one or more defects to confirm the one or more amounts were obtained.
地址 Oakland CA US