发明名称 |
Aluminum gallium nitride barriers and separate confinement heterostructure (SCH) layers for semipolar plane III-nitride semiconductor-based light emitting diodes and laser diodes |
摘要 |
A semipolar plane III-nitride semiconductor-based laser diode or light emitting diode, comprising a semipolar Indium containing multiple quantum wells for emitting light, having Aluminum containing quantum well barriers, wherein the Indium containing multiple quantum well and Aluminum containing barriers are grown in a semipolar orientation on a semipolar plane. |
申请公布号 |
US8761218(B2) |
申请公布日期 |
2014.06.24 |
申请号 |
US201113080260 |
申请日期 |
2011.04.05 |
申请人 |
The Regents of the University of California |
发明人 |
Lin You-Da;Ohta Hiroaki;Nakamura Shuji;DenBaars Steven P.;Speck James S. |
分类号 |
H01S5/34;H01S5/343 |
主分类号 |
H01S5/34 |
代理机构 |
Gates & Cooper LLP |
代理人 |
Gates & Cooper LLP |
主权项 |
1. A method of using an Aluminum (Al) containing barrier layer in a quantum well structure of a device, comprising:
determining one or more acceptable amounts of one or more defects selected from misfit dislocations, stacking faults, and triangular dark defects, and triangular non-luminescent defects; selecting one or more Al compositions to obtain the amounts of the one or more defects; depositing, in a quantum well structure of a device, one or more Al containing barrier layers having the one or more Al compositions to reduce or prevent formation of the one or more defects in the device; and measuring the one or more defects to confirm the one or more amounts were obtained.
|
地址 |
Oakland CA US |