发明名称 Electronic device, conductive composition, metal filling apparatus, and electronic device manufacturing method
摘要 A method includes applying, between connection conductors of adjacent substrates, a junction material containing the first metal or alloy component and the second metal or alloy component having a higher melting point than said first metal or alloy component. The method further includes melting the junction material by a heat treatment.
申请公布号 US8759211(B2) 申请公布日期 2014.06.24
申请号 US201313793947 申请日期 2013.03.11
申请人 Napra Co., Ltd. 发明人 Sekine Shigenobu;Sekine Yurina;Kuwana Yoshiharu;Kimura Ryuji
分类号 H01L21/4763 主分类号 H01L21/4763
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method for manufacturing a substrate, the method comprising the steps of: placing a substrate with a minute space in a processing chamber; filling said minute space with an inorganic insulating paste material by first reducing and then increasing a pressure of an atmosphere in said processing chamber; and hardening said inorganic insulating material while applying a centrifugal force due to rotation of said substrate to said inorganic insulating paste material in said minute space.
地址 Katsushika-ku JP