发明名称 |
Electronic device, conductive composition, metal filling apparatus, and electronic device manufacturing method |
摘要 |
A method includes applying, between connection conductors of adjacent substrates, a junction material containing the first metal or alloy component and the second metal or alloy component having a higher melting point than said first metal or alloy component. The method further includes melting the junction material by a heat treatment. |
申请公布号 |
US8759211(B2) |
申请公布日期 |
2014.06.24 |
申请号 |
US201313793947 |
申请日期 |
2013.03.11 |
申请人 |
Napra Co., Ltd. |
发明人 |
Sekine Shigenobu;Sekine Yurina;Kuwana Yoshiharu;Kimura Ryuji |
分类号 |
H01L21/4763 |
主分类号 |
H01L21/4763 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method for manufacturing a substrate, the method comprising the steps of:
placing a substrate with a minute space in a processing chamber; filling said minute space with an inorganic insulating paste material by first reducing and then increasing a pressure of an atmosphere in said processing chamber; and hardening said inorganic insulating material while applying a centrifugal force due to rotation of said substrate to said inorganic insulating paste material in said minute space.
|
地址 |
Katsushika-ku JP |