Deposition system with a rotating drum

摘要

A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least one substrate mounted to a surface of the drum. The surface alternately passes through the metallization zone and passes through the reaction zone. A target is sputtered in the metallization zone to create a film on the at least one substrate. The film on the at least one substrate is reacted in the reaction zone.

主权项

1. A deposition system comprising
a metallization zone including a sputtering system for metal film deposition; a reaction zone including an ionization source for generating at least one reactive ionic species; a rotatable mount configured to hold at least one substrate and to pass at least a portion of the substrate alternately through said metallization and reaction zones so as to deposit a metal film on said substrate portion in the metallization zone and to react the metal film with said at least one reactive ionic species in said reaction zone; and at least one diffusive gas barrier disposed between said metallization and reaction zones for maintaining a pressure differential therebetween, wherein the reaction zone comprises a pair of inner baffles interposed between a pair of differential pumps, and a pair of outer baffles between which the differential pumps are interposed.