发明名称 Liquid ejecting head and liquid ejecting apparatus
摘要 A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
申请公布号 US8757777(B2) 申请公布日期 2014.06.24
申请号 US201313973483 申请日期 2013.08.22
申请人 Seiko Epson Corporation 发明人 Matsuzawa Akira;Ota Mutsuhiko;Takahashi Tetsushi;Matsumoto Yasuyuki
分类号 B41J2/045;B41J2/05;B41J2/14 主分类号 B41J2/045
代理机构 Workman Nydegger 代理人 Workman Nydegger
主权项 1. A liquid ejecting head comprising: a fluid channel formation substrate that is made of a silicon single crystal substrate having a crystal face orientation of (110), the fluid channel formation substrate having a plurality of separate flow channels demarcated by partition walls, each of the separate flow channels being in communication with a nozzle opening that ejects liquid drops, and the fluid channel formation substrate further having a communication portion that is in communication with each of the separate flow channels wherein the tip surface at the communication portion side of each of the partition walls has a gradual diminution portion formed thereon, the gradual diminution portion being, in the thickness direction of the partition walls, slanted downward toward the communication portion, and the gradual diminution portion having an angle of gradient that gradually decreases toward one end portion of the partition wall, wherein each of the gradual diminution portions is configured as a plurality of surfaces.
地址 Tokyo JP