发明名称 |
Range image generation apparatus, position and orientation measurement apparatus, range image processing apparatus, method of controlling range image generation apparatus, and storage medium |
摘要 |
A range image generation apparatus includes: a generation unit adapted to generate a first range image of a target measurement object at one of a predetermined in-plane resolution and a predetermined depth-direction range resolving power; an extraction unit adapted to extract range information from the first range image generated by the generation unit; and a determination unit adapted to determine, as a parameter based on the range information extracted by the extraction unit, one of an in-plane resolution and a depth-direction range resolving power of a second range image to be generated by the generation unit, wherein the generation unit generates the second range image using the parameter determined by the determination unit. |
申请公布号 |
US8761440(B2) |
申请公布日期 |
2014.06.24 |
申请号 |
US201113310995 |
申请日期 |
2011.12.05 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Honjo Tomoya;Matsugu Masakazu;Watanabe Ikuo |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
Fitzpatrick, Cella, Harper & Scinto |
代理人 |
Fitzpatrick, Cella, Harper & Scinto |
主权项 |
1. A range image generation apparatus comprising:
a first generation unit configured to generate a first range image of a target measurement object at one of a predetermined in-plane resolution and a predetermined depth-direction resolving power by projecting a first pattern onto the target measurement object; an extraction unit configured to extract range information from the first range image generated by said first generation unit; a determination unit configured to determine, as a parameter based on the range information extracted by said extraction unit, at least one of an in-plane resolution and a depth-direction resolving power of a second range image; and a second generation unit configured to generate the second range image of the target measurement object by projecting a second pattern onto the target measurement object based on the determined parameter.
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地址 |
Tokyo JP |