| 摘要 |
[Problem] To provide a composition for forming an overlay film and a pattern formation method using said composition, with which a pattern exhibiting excellent roughness and an excellent pattern shape can be formed in a pattern formation method using extreme ultraviolet light exposure. [Solution] This composition for forming an overlay film is characterized by including a solvent, and a fullerene derivative having a hydrophilic group. Furthermore, provided is a method in which said composition is applied to a resist surface, exposed to light, and developed, thereby forming a pattern. A polymer can also be included in said composition. |
