| 发明名称 |
THIN FILM DEPOSITION APPARATUS AND METHOD |
| 摘要 |
A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time. |
| 申请公布号 |
US2014170301(A1) |
申请公布日期 |
2014.06.19 |
| 申请号 |
US201313797573 |
申请日期 |
2013.03.12 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
Jo Yong Hun;Ahn Jae Hong;Lee Jong Woo |
| 分类号 |
C23C16/52 |
主分类号 |
C23C16/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A thin film deposition apparatus, comprising:
a deposition source configured to emit a deposition material that is to be deposited on a surface of a substrate; a transfer unit configured to move the deposition source; a thickness measurement sensor configured to measure a thickness of the deposition material deposited on the surface of the substrate; and a transfer controller configured to adjust a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.
|
| 地址 |
Yongin-city KR |
