| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a nano-imprint mold which allows for correction of uneven size of the mold formed finally, by correcting the size of uneven mask pattern, when forming an uneven mask pattern, that can be a mask for etching, on a substrate, and to provide a nano-imprint mold having an uneven portion formed homogeneously by a single material.SOLUTION: A method of manufacturing a nano-imprint mold includes a basic mask patterning step for patterning a convex basic mask on a substrate with an intermediate film interposed therebetween, and a size correction film formation step for forming a size correction film for correcting the size of a convex basic mask for the above-mentioned convex basic mask. |
