| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that enables production of a resist pattern with an excellent shape.SOLUTION: A resist composition contains a resin that has a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not have an acid-labile group, a resin having an acid-labile group, and an acid generator represented by formula (II), wherein Rand Rare a hydrogen atom or a methyl group; Ris an alicyclic hydrocarbon group; Lis a divalent saturated hydrocarbon group or a single bond; Ris a saturated hydrocarbon group having a fluorine atom; Qand Qare independently a fluorine atom or a perfluoroalkyl group; Lis a divalent saturated hydrocarbon group; and a ring W is an alicyclic hydrocarbon ring; Rand Rare independently a fluorine atom or a fluorinated alkyl group; n is an integer of 1-10; and Zis an organic cation. |
