发明名称 MULTILAYER ELECTRONIC STRUCTURES WITH INTEGRAL VIAS EXTENDING IN IN-PLANE DIRECTION
摘要 A multilayer electronic support structure comprising at least one pair of adjacent feature layers extending in an X-Y plane that are separated by a via layer; said via layer comprising a dielectric material that is sandwiched between the two adjacent feature layers and at least one one non-cylindrical via post that couples said pair of adjacent feature layers through the dielectric material in a Z direction perpendicular to the X-Y plane; wherein said at least one non-cylindrical via post is characterized by having a long dimension in the X-Y plane that is at least 3 times as long as a short dimension in the X-Y plane.
申请公布号 KR101409801(B1) 申请公布日期 2014.06.19
申请号 KR20120092928 申请日期 2012.08.24
申请人 发明人
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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