发明名称 Metal multi-layered film structure and method of manufacturing and use of the same
摘要 <p>The invention relates to a metal multi-layered film structure, comprising two types of metal films including first metal films and second metal films alternately formed on a resin substrate. The first metal films are composed of an aluminum-based material having a film thickness between 0.7 nm and 20 nm. The second metal films are composed of one selected from the group consisting of stainless steel-based materials, nickel-based materials, cobalt-based materials, titanium-based materials and chromium-based materials, having a film thickness ranging from 1 nm to 20 nm. This metal multi-layered film structure can be manufactured through a method of sputtering. The metal multi-layered film structure is suitable for an extension reflector for vehicular lamps.</p>
申请公布号 EP1889941(B1) 申请公布日期 2014.06.18
申请号 EP20070015895 申请日期 2007.08.13
申请人 STANLEY ELECTRIC CORPORATION 发明人 SUZUKI, YOSHIO;SUZUKI, AKIRA
分类号 C23C14/34;C23C14/20;C23C14/56;C23C28/02;F21V7/22;G02B5/08 主分类号 C23C14/34
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