发明名称 Method for driving a nonvolatile semiconductor memory device
摘要 A method for driving a nonvolatile semiconductor memory device is provided. The nonvolatile semiconductor memory device includes a semiconductor layer having a channel, a first insulating film provided on the channel, a floating electrode provided on the first insulating film, a second insulating film provided on the floating electrode, and a gate electrode provided on the second insulating film, and changes its data memory state by injection of charges into the floating electrode. The method includes to achieve a state in which charges having a first polarity are injected into the floating electrode: providing a first potential difference between the semiconductor layer and the gate electrode to inject charges having the first polarity into the second insulating film; subsequently providing a second potential difference between the semiconductor layer and the gate electrode to inject charges having a second polarity opposite to the first polarity into the second insulating film; and subsequently providing a third potential difference between the semiconductor layer and the gate electrode to inject charges having the first polarity into the floating electrode.
申请公布号 USRE44950(E1) 申请公布日期 2014.06.17
申请号 US201213687343 申请日期 2012.11.28
申请人 Kabushiki Kaisha Toshiba 发明人 Fujiki Jun
分类号 G11C11/34;H01L27/115;G11C16/10 主分类号 G11C11/34
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method for driving a nonvolatile semiconductor memory device having a semiconductor layer having a channel and source/drain regions provided on both sides of the channel, a first insulating film provided on the channel, a floating electrode provided on the first insulating film, a second insulating film provided on the floating electrode, and a gate electrode provided on the second insulating film, the nonvolatile semiconductor memory device changing its data memory state by injection of charges into the floating electrode, the method comprising, to achieve a state in which charges having a first polarity are injected into the floating electrode: providing a first potential difference between the semiconductor layer and the gate electrode to inject charges having the first polarity into the second insulating film; subsequently providing a second potential difference between the semiconductor layer and the gate electrode to inject charges having a second polarity opposite to the first polarity into the second insulating film; and subsequently providing a third potential difference between the semiconductor layer and the gate electrode to inject charges having the first polarity into the floating electrode.
地址 Tokyo JP