发明名称 Multi-chip wafer level package
摘要 A multi-chip wafer level package comprises three stacked semiconductor dies. A first semiconductor die is embedded in a first photo-sensitive material layer. A second semiconductor die is stacked on top of the first semiconductor die wherein the second semiconductor die is face-to-face coupled to the first semiconductor die. A third semiconductor die is back-to-back attached to the second semiconductor die. Both the second semiconductor die and the third semiconductor die are embedded in a second photo-sensitive material layer. The multi-chip wafer level package further comprises a plurality of through assembly vias formed in the first photo-sensitive material layer and the second photo-sensitive material layer.
申请公布号 US8754514(B2) 申请公布日期 2014.06.17
申请号 US201113206694 申请日期 2011.08.10
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yu Chun Hui;Tung Chih-Hang;Shao Tung-Liang;Yu Chen-Hua;Shih Da-Yuan
分类号 H01L23/02;H01L21/00;H01L23/48;H01L23/522;H01L23/538;H01L23/00;H01L21/768;H01L25/065 主分类号 H01L23/02
代理机构 Slater and Matsil, L.L.P. 代理人 Slater and Matsil, L.L.P.
主权项 1. A device comprising: a first semiconductor die embedded in a first photo-sensitive material layer; a second semiconductor die stacked on top of the first semiconductor die, wherein the second semiconductor die is face-to-face coupled to the first semiconductor die; a second photo-sensitive material layer formed on top of the first photo-sensitive material layer, wherein the second semiconductor die is embedded in the second photo-sensitive material layer; a dielectric layer directly in contact and between the first photo-sensitive material layer and the second photo-sensitive material layer, wherein a plurality of first vias formed between the first semiconductor die and the second semiconductor die and the first vias are formed in the first photo-sensitive material layer, and wherein a plurality of second vias formed in the dielectric layer and each second via is vertically aligned with a corresponding first via and a redistribution line is formed between the second via and the corresponding first via; and a plurality of through vias formed in the first photo-sensitive material layer and the second photo-sensitive material layer.
地址 Hsin-Chu TW
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