发明名称 METHOD OF FINISHING SIDE SURFACES OF TRANSPARENT SUBSTRATE FOR DISPLAY DEVICE AND FINISHING APPARATUS USING SAME
摘要 The present invention relates to a method of processing a lateral side of a transparent substrate for a display device, and a processing apparatus using the same comprising: a substrate preparing step for preparing a transparent substrate having a size used for a display device; a laser beam entering step for entering a first laser beam into a lateral side by moving the first laser beam oscillated from a laser beam irradiator at an incline as much as a first gradient from the outside of the transparent substrate to the edge of the lateral side of the transparent substrate; a laser beam moving step for performing a polishing process of the lateral side by irradiating the lateral side circumference of the transparent substrate with the first laser beam while moving the first laser beam to the lateral side of the transparent substrate; and a laser beam separating step for separating the first laser beam to the outside of the lateral side by moving the first laser beam oscillated from the laser beam irradiator at an incline as much as a second gradient from the lateral side of the transparent substrate to the edge of the lateral side of the transparent substrate. Therefore, the deviation for introducing energy from laser beam to the lateral side of the transparent substrate is reduced, so a microcrack due to thermal stress in the lateral side of the transparent substrate can be prevented.
申请公布号 KR101406139(B1) 申请公布日期 2014.06.16
申请号 KR20140038433 申请日期 2014.04.01
申请人 KOREA SEMICINDUCTOR SYSTEM CO., LTD. 发明人 HYUN, SUNG DAI;PARK, BYOUNG SUNG;LEE, BYUNG HUN;PARK, BYEONG IN;LEE, HYEON CHEOL
分类号 B23K26/36;B23K26/70 主分类号 B23K26/36
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