| 摘要 |
PURPOSE: A non-contact plasma ashing apparatus is provided to supply a gas to the space between a mask and a substrate and discharge it to the edge of the mask, and to prevent an ashing gas from flowing into a mask region. CONSTITUTION: A stage(110) is installed in a process chamber and fixes a substrate(S). A mask(120) is arranged in the stage at regular intervals and moves on the stage. The mask includes a mask body(121) for forming a masking area and a sidewall(122) extended from the lower part of the mask body to the stage. A gas supply part(130) supplies a gas between the stage and the mask. A driving part(140) moves the mask to the stage. |
