发明名称 SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON BASED INKS AND CORRESPONDING PROCESSES
摘要 The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.
申请公布号 US2014162445(A1) 申请公布日期 2014.06.12
申请号 US201414180600 申请日期 2014.02.14
申请人 NanoGram Corporation 发明人 Liu Guojun;Srinivasan Uma;Chiruvolu Shivkumar
分类号 H01L21/225 主分类号 H01L21/225
代理机构 代理人
主权项 1. A dopant source composition comprising a blend of a solvent, a glass/ceramic precursor composition, and doped particles selected from the group consisting of doped silicon nanoparticles, doped silica nanoparticles or a combination thereof.
地址 Milpitas CA US