发明名称 |
SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON BASED INKS AND CORRESPONDING PROCESSES |
摘要 |
The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells. |
申请公布号 |
US2014162445(A1) |
申请公布日期 |
2014.06.12 |
申请号 |
US201414180600 |
申请日期 |
2014.02.14 |
申请人 |
NanoGram Corporation |
发明人 |
Liu Guojun;Srinivasan Uma;Chiruvolu Shivkumar |
分类号 |
H01L21/225 |
主分类号 |
H01L21/225 |
代理机构 |
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代理人 |
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主权项 |
1. A dopant source composition comprising a blend of a solvent, a glass/ceramic precursor composition, and doped particles selected from the group consisting of doped silicon nanoparticles, doped silica nanoparticles or a combination thereof.
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地址 |
Milpitas CA US |