MEARSUREMENT UNIT OF FILM THICKNESS PER UNIT TIME FOR OLED IN-LINE DEPOSITION SYSTEM

摘要

An objective of the present invention is to provide a film thickness measuring apparatus capable of measuring the film thicknesses of a plurality of evaporation sources disposed at each deposition chamber at one time by moving a sampling substrate using a propelling force of a tray in an OLED in-line deposition system in which a plurality of deposition chambers are arranged in a row. According to the present invention, in the OLED in-line deposition system in which a plurality of deposition chambers are arranged in a row, in order to measure the film thickness for an evaporation source disposed at each chamber, a plurality of sampling substrates are arranged in a row on a tray for film thickness measurement including a moving member to move the sampling substrates using the propelling force of the tray. An opening is formed at the rear end of the arranged sampling substrates. A deposition layer is formed on the substrate disposed at the opening by moving the sampling substrates toward the opening by one block at a time. As the tray moves through the chambers, a thin film for film thickness measurement is formed on each sampling substrate sequentially disposed at the opening. Accordingly, the film thicknesses of evaporation sources located at a plurality of deposition chambers can be measured by moving the in-line apparatus for film thickness measurement once.