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发明名称
真空处理装置及程式
摘要
申请公布号
TWI441277
申请公布日期
2014.06.11
申请号
TW100102146
申请日期
2011.01.20
申请人
日立全球先端科技股份有限公司 日本
发明人
仲田辉男;近藤英明;田内勤;野木庆太
分类号
H01L21/677
主分类号
H01L21/677
代理机构
代理人
陈长文 台北市松山区敦化北路201号7楼
主权项
地址
日本
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