Apparatus and method for multiple symmetrical divisional gas distribution

摘要

An apparatus and method for multiple symmetrical divisional gas distribution providing a mounting plate, a plurality of manifolds coupled to the mounting plate, a center purge block coupled to the mounting plate and the plurality of manifolds, a plurality of reactant distribution blocks, wherein each reactant distribution block is stacked atop each other to form a reactant distribution block stack, wherein the reactant distribution block stack sits atop the center purge block, a coupling mechanism to secure the plurality of reactant distribution blocks of the reactant distribution block stack together; and a top cap coupled to the reactant distribution block stack and the coupling mechanism.

主权项

1. A system for distributing materials in a semiconductor processing chamber, said system comprising:
a mounting plate comprising a plurality of threaded mounting plate outer holes and a plurality of mounting plate inner holes; a plurality of manifolds coupled to said mounting plate; a center purge block coupled to said mounting plate and said plurality of manifolds; a plurality of reactant distribution blocks, wherein the plurality of reactant distribution blocks are stacked to form a reactant distribution block stack, wherein said reactant distribution block stack sits atop said center purge block; a coupling mechanism to secure said plurality of reactant distribution blocks of said reactant distribution block stack together; and a top cap coupled to said reactant distribution block stack and said coupling mechanism.