发明名称 SUBSTRATE HOLDING DEVICE AND POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate holding device capable of promptly detecting a lubrication oil, such as grease, which leaks from a top ring rotation motor and intrudes into a top ring head and preventing the lubrication oil from leaking from the top ring head to the exterior.SOLUTION: A substrate holding device includes: a top ring shaft 11 which moves up and down a top ring 1 for holding a substrate and pressing the substrate to a polishing pad and rotates the top ring 1; a top ring rotation motor 14 which rotates the top ring shaft 11; a rotation transmission mechanism which transmits rotations of the top ring rotation motor 14 to the top ring shaft 11; and a box shaped top ring head 10 which holds the top ring rotation motor 14 and houses the rotation transmission mechanism. The top ring head 10 is provided with an oil pan 30 which receives leakage of a lubrication oil for lubricating a speed reduction mechanism of the top ring rotation motor 14, and a liquid leakage sensor 35 which detects the lubrication oil is provided in the oil pan 30.
申请公布号 JP2014104557(A) 申请公布日期 2014.06.09
申请号 JP20120260594 申请日期 2012.11.29
申请人 EBARA CORP 发明人 UMEMOTO MASAO;MARUYAMA TORU
分类号 B24B37/30;H01L21/304 主分类号 B24B37/30
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