发明名称 DEPOSITION TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a deposition treatment method with high deposition speed by which a stable-shaped deposition part 6 is formed on a surface of a deposited body 2 and equipment can be made small and inexpensive.SOLUTION: In a deposition treatment method for coupling one part of a deposition source 3 with a surface of a deposited body 2 to deposit a film, the deposited boy 2 is opposed to the deposition source 3 in a vacuum furnace 4. Then, the deposition source 3 and the deposited body 2 are induction-heated by a coil 1a of a high frequency heating device 1 at temperature not higher than a melting point of the deposition source 3. Thereby, one part of the deposition source 3 is moved to the surface of the deposited body 2, so as to form the deposition part 6 on the surface of the deposited body 2. The deposition part 6 is formed on the surface of the deposited body 2 after separating the deposited body 2 and the deposition source 3 after heating.
申请公布号 JP2014105377(A) 申请公布日期 2014.06.09
申请号 JP20120261394 申请日期 2012.11.29
申请人 DENSO CORP;TOKYO INSTITUTE OF TECHNOLOGY 发明人 SUZUMURA AKIO;IKESHOJI TOSHITAKA;IMOTO AKIKO;KATORI MANA;SAKAMOTO MASAHIRO;SAKIMICHI TORU
分类号 C23C26/00 主分类号 C23C26/00
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