发明名称 HIGH PRESSURE VESSEL, SUBSTRATE PROCESSING APPARATUS, AND MANUFACTURING METHOD OF HIGH PRESSURE VESSEL
摘要 <p>PROBLEM TO BE SOLVED: To provide a high pressure vessel etc. capable of forming a processing space achieving high level cleanliness.SOLUTION: In a high pressure vessel, treatment is performed on a substrate by a high pressure fluid. Further, a cavity part is formed by processing performed from one surface of a flat rectangular parallelepiped metal block 5 which is other than a widest area surface, and noble metal plating 7 is formed on an inner wall surface facing the cavity part to form a vessel body. In a case where the cavity part is formed as a through hole, a lid which opens and closes the cavity part is provided at the one side surface of the through hole and a second block which closes the cavity part in an airtight manner is provided on the other side surface.</p>
申请公布号 JP2014107488(A) 申请公布日期 2014.06.09
申请号 JP20120261110 申请日期 2012.11.29
申请人 TOKYO ELECTRON LTD 发明人 MITSUOKA KAZUYUKI;YO HAJIME;ONO HIROMOTO;ORII TAKEHIKO;TOSHIMA TAKAYUKI;INATOMI HIROAKI
分类号 H01L21/304;B23H9/00 主分类号 H01L21/304
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